Carl Zeiss reports two further orders for the mask registration metrology system PROVETM. The recently launched system is already installed at customer sites in Asia and USA and enables high resolution in-die registration measurements on photomasks.
“The first customers using the PROVE tool confirmed the unique performance in terms of repeatability, tool stability, and measurement accuracy.” states Dr. Oliver Kienzle, Managing Director of Carl Zeiss Semiconductor Metrology Systems Division, a leading supplier for photomask metrology and repair tools. “We are pleased that the impressive measurement results convinced two further Mask Manufacturers to order a PROVE system in order to enable their future mask manufacturing. With the growing installed base PROVE gains rapidly footprint in the market.”
One striking benefit for the customers is the diffraction limited, high resolution imaging optic working at the lithographic relevant 193nm wavelength. This enables the measurement of arbitrary production features without placing registration marks. The proprietary autofocus and calibration strategy of the new system enables a repeatability of below 0.5nm and an accuracy of below 1nm for best registration measurement performance.
Recently Carl Zeiss and Synopsys announced the joint development of a new CATS data preparation output module for PROVE registration measurements, which will further improve the PROVE usability.
The next deliveries for PROVE systems are scheduled for December 2010.
